Kla-Tencor Corporation

Contact Details: 160 Rio Robles San Jose CA 95134 United States of America Tel: 408-875-3000 Fax: 408-875-4144 Email: WWW: www.kla-tencor.com

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Recent Publications by Kla-Tencor Corporation:
Image registration and object recognition using affine invariants and convex hulls. This paper is concerned with the problem of feature point registration and...	13th February, 2008	KLA-Tencor Corp., San Jose, CA.	IEEE Trans Image Process. 1999;8(7):934-46. DOI Direct Link
Cross Burg entropy maximization and its application to ringing suppression in image reconstruction. We present a multiplicative algorithm for image reconstruction, together...	13th February, 2008	KLA-Tencor Corp., San Jose, CA.	IEEE Trans Image Process. 1999;8(2):286-92. DOI Direct Link
State-based SHOSLIF for indoor visual navigation. In this paper, we investigate vision-based navigation using the...	6th February, 2008	KLA Tencor, San Jose, CA, USA.	IEEE Trans Neural Netw. 2000;11(6):1300-14. DOI Direct Link
A computationally efficient superresolution image reconstruction algorithm. Superresolution reconstruction produces a high-resolution image from a set...	6th February, 2008	KLA-Tencor Corp., Milpitas, CA.	IEEE Trans Image Process. 2001;10(4):573-83. DOI Direct Link

BioNews Results for Kla-Tencor Corporation:
KLAS Examines Allscripts One Year After the Misys Merger	Health Management Technology:  Nov 17 2009 4:23AM Matching: kla
Hyland Software One of the 'Clear Document Management and Imaging Leaders' According to New KLAS Report	Freshnews.com:  Nov 12 2009 1:30PM Matching: kla
Hyland Software One of the 'Clear Document Management and Imaging Leaders' According to New KLAS Report	Montana's News Station:  Nov 12 2009 1:16PM Matching: kla
Hyland Software's OnBase rated as one of the top DMI system solutions on the market	News-Medical.Net:  Nov 12 2009 2:14PM Matching: kla
New ChartMaxx V5.5 with RAC Manager Helps Hospitals Handle RAC Audit Requests	Medicexchange.com:  Nov 4 2009 5:11AM Matching: kla
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Kla-Tencor Corporation Patents:
US Patent No.	Title
7541115	Use of calcium fluoride substrate for lithography masks
7560703	Integrated segmented scintillation detector
7560939	Electrical defect detection using pre-charge and sense scanning with prescribed delays
7561282	Techniques for determining overlay and critical dimension using a single metrology tool
7564545	Inspection methods and systems for lithographic masks
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