Restek Corporation

Contact Details: 110 Benner Circle Bellefonte PA 16823 United States of America Tel: 814-353-1300 Fax: 814-353-9278 Email: gfrance@restekcorp.com

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Recent Publications by Restek Corporation:
Simplifying the setup for vacuum-outlet GC: using a restriction inside the injection port. The application of vacuum GC has several advantages over pressurized GC....	2nd September, 2009	Restek Corporation, Middelburg,	J Sep Sci. 2009 Jun;32(11):1849-57. DOI Direct Link
Evaluation of comprehensive two-dimensional gas chromatography - time-of-flight mass spectrometry for the determination of pesticides in tobacco. Comprehensive two-dimensional gas chromatography (GC x GC) with fast...	14th June, 2008	Restek Corporation, 110 Benner Circle, Bellefonte, PA 16823, USA.	J Chromatogr A. 2008 Apr 4;1186(1-2):202-10. Epub 2008 Jan 21. DOI Direct Link
Using computer modeling to predict and optimize separations for comprehensive two-dimensional gas chromatography. In order to fully realize the separation power of comprehensive...	14th June, 2008	Restek Corporation, 110 Benner Circle, Bellefonte, PA 16823, USA.	J Chromatogr A. 2008 Apr 4;1186(1-2):196-201. Epub 2007 Dec 23. DOI Direct Link
High-speed analysis of residual solvents by flow-modulation gas chromatography. High-speed gas chromatographic (GC) separation of residual solvents in...	10th September, 2004	Restek Corporation, 110 Benner Circle, Bellefonte, PA 16823, USA.	J Chromatogr A. 2004 Feb 20;1027(1-2):75-82.

Restek Corporation Patents:
US Patent No.	Title
7316730	Inlet double-seal assembly
7070833	Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
6511760	Method of passivating a gas vessel or component of a gas transfer system using a silicon overlay coating
6444326	Surface modification of solid supports through the thermal decomposition and functionalization of silanes
5487569	Connector for three or more capillary tubes
→View more Restek Corporation patents.

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