New technique builds graphene-boron sheets without substrate
15:35 EDT 29 Aug 2012 | R&D Magazine
Engineers at Cornell University have invented a way to pattern single atom films of graphene and boron nitride, an insulator, without the use of a silicon substrate. The technique, called patterned regrowth, is reliant on conventional silicon pho..
Original Article: New technique builds graphene-boron sheets without substrate
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