The Impact of Electron Beam Heating during 3D Nanoprinting.

08:00 EDT 15th April 2019 | BioPortfolio

Summary of "The Impact of Electron Beam Heating during 3D Nanoprinting."

An artifact limiting the reproduction of 3D designs using nanoprinting has been quantified. Beam induced heating was determined, through complementary experiments, models and simulations, to affect the deposition rate during the 3D nanoprinting of mesh objects using focused electron beam induced deposition (FEBID). The mesh objects are constructed using interconnected nanowires. During nanowire growth, the beam interaction driving deposition also causes local heating. The temperature at the beam interaction region (BIR) progressively rises as thermal resistance increases with nanowire growth. Heat dissipation resembles the classical mode of heat transfer from extended surfaces; heat must flow through the mesh object to reach the substrate sink. Simulations reveal that beam heating causes an increase in the rate of precursor desorption at the BIR causing a concomitant decrease in the deposition rate. Temperature changes as small as 10 K produce noticeable changes in deposit geometry - nanowires appear to deflect/curve toward the substrate because the vertical growth rate decreases. 3D FEBID naturally ensues from the substrate surface, upward, inducing a vertical temperature gradient along the deposit. Simulations, experiments, temperature-controlled studies, and process current monitoring all confirm the cause of nanowire distortion as beam induced heating while also revealing the rate determining physics governing the final deposit shape.


Journal Details

This article was published in the following journal.

Name: ACS nano
ISSN: 1936-086X


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Medical and Biotech [MESH] Definitions

Microscopy using an electron beam, instead of light, to visualize the sample, thereby allowing much greater magnification. The interactions of ELECTRONS with specimens are used to provide information about the fine structure of that specimen. In TRANSMISSION ELECTRON MICROSCOPY the reactions of the electrons that are transmitted through the specimen are imaged. In SCANNING ELECTRON MICROSCOPY an electron beam falls at a non-normal angle on the specimen and the image is derived from the reactions occurring above the plane of the specimen.

Microscopy in which the object is examined directly by an electron beam scanning the specimen point-by-point. The image is constructed by detecting the products of specimen interactions that are projected above the plane of the sample, such as backscattered electrons. Although SCANNING TRANSMISSION ELECTRON MICROSCOPY also scans the specimen point by point with the electron beam, the image is constructed by detecting the electrons, or their interaction products that are transmitted through the sample plane, so that is a form of TRANSMISSION ELECTRON MICROSCOPY.

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A type of TRANSMISSION ELECTRON MICROSCOPY in which the object is examined directly by an extremely narrow electron beam scanning the specimen point-by-point and using the reactions of the electrons that are transmitted through the specimen to create the image. It should not be confused with SCANNING ELECTRON MICROSCOPY.

The science and application of a double-beam transmission interference microscope in which the illuminating light beam is split into two paths. One beam passes through the specimen while the other beam reflects off a reference mirror before joining and interfering with the other. The observed optical path difference between the two beams can be measured and used to discriminate minute differences in thickness and refraction of non-stained transparent specimens, such as living cells in culture.

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